linear nanopositioning stage / Z-axis / 1-axis / roller

The nano-precision elevation stage NPE-200 offers the highest precision in our elevation stage series. Maximum positioning accuracy and high stiffness makes this stage especially suitable for lithography, fiber alignment and wafer inspection. High-quality, double cross-roller bearings mounted on a stress-relieved, tempered aluminum-alloy body guarantee a non-warping stage structure, high stiffness and smooth motion. Position stability of less than 5 nm stable over a period of 1 minute can be achieved. The NPE-200 is equipped with a 2-phase stepper motor using a backlash-free gear-head (ratio=50:1), two mechanical limit switches and a linear scale which is center mounted for highest accuracy. All nano-precision elevation stages are supplied with a certificate of performance (flatness, pitch, yaw, straightness & accuracy).