analog pyrometer / surface-mount / for MOCVD-process

The model LumaSense UV 400 and UVR 400 systems are the next generation of temperature sensors developed specifically for GaN-based MOCVD epitaxy processes. The UV 400 and UVR 400 now allow direct measurement of the wafer surface temperature instead of the traditional susceptor/pocket temperature. This improved measurement allows more accurate control of the wafer temperature leading to an improved yield.

These systems are now setting a new standard for LED production processes with results showing reliable correlation between process temperature and final product wavelength.

Features:
Measure temperature directly on the GaN layer using UV wavelength instrumentation
Provides a wide temperature range (650 … 1300 °C) to allow coverage of both main buffer growth and MQW growth
Minimize noise in measurement using true photon-counting instrumentation
Capture real time reflectance measurement using a fast pulsing light source
Includes 2 interface types: Analog output and RS485 with UPP protocol

Benefits:
Improve yield through accurate true wafer temperature measurement
Obtain reliable wafer temperature with PL wavelength correlation
Prevent residue temperature oscillation as seen in NIR emissivity-compensated pyrometers
Realize continuous real time reflectance measurement
Prevent data skew due to delayed sampling (no shutter on and off)
Provides a complete solution for reactor temperature control with PhotriX and concentric lightpipe options