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PVD Deposition Machine / Magnetron Sputtering

PVD deposition machine / magnetron sputtering

i40A

INO Group

PVD deposition machine / magnetron sputtering
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  • Method:

    PVD

  • Technology:

    magnetron sputtering

Features
Compact conventional Arc system
Round target (5 inch x 15mmt)
Static rotation table (3 axes x 135mm H)
Pulsed DC bias &Turbo molecular pump
System Size : 2m(L) x 1.5m(W) x 1.8m(H)

Combination
i40A : Conventional Arc system for DLC
Excellent surface morphology
High hardness for endmill and drill
i40S : Unbalanced Magnetron Sputter
Target size : 203. 2mm x 127mm x 12mmt

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