ellipsometry measuring device for the semiconductor industry

The S3000A™ System is a production worthy, high-performance transparent metrology tool for 300mm fab-wide applications.

It incorporates Rudolph’s Focused Beam ellipsometry technology which was developed for demanding diffusion applications. The value-engineered S3000A is designed for transparent film applications in the litho, etch, thin films, and CMP areas.

Specification

Single wavelength ellipsometry and whole wafer MAControl for advanced gate metrology
Laser source high brightness and wavelength stability gives excellent repeatability
Angular resolved laser ellipsometry provides simple calibration and easy tool to tool matching
Focused beam ellipsometry does not require complicated dispersion models
The ellipsometer small site option provides capability to measure 50x50 micron measurement sites or in narrow scribe lines for advanced processes
Optional DUV-reflectometer provides highly repeatable measurements for 193 nm lithography processes
Optional Cognex PatMAX® geometric pattern recognition software provides robust performance for wafers with extreme color variation or extremely low contrast
Optional MAControl module for one-step, uniform, non-destructive removal of AMC layer
Enhanced data review mode provides improved 2D/3D mapping, data combination, measurement results review and other advanced features