CVD deposition machine / thermal evaporation / thin-film / vacuum
ÉcoCoat
INO Group

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Method:
CVD
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Technology:
thermal evaporation
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Deposition type:
thin-film
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Other characteristics:
vacuum
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Applications:
for microelectronics industry
YES vapor deposition systems provide total environmental control over the deposition process and accommodate a variety of functionally diverse silanes, for a variety of processes, on a variety of surfaces.
YES works collaboratively with Brigham Young University, Department of Chemistry and Biochemistry to develop and prove processes using the YES-ÉcoCoat. Read more about the collaboration here.
The YES-ÉcoCoat manual batch load, vapor phase deposition system is designed for today’s leading technology products that require precise surface modification over nanoscale surface areas. Whether it’s molecular specific bonding sites for DNA microarrays or precise surface modification to reduce stiction for MEMS devices, the capability to use a large number of different organosilanes provides the ability for precise surface modification. Flexibility of production is assured with an optional chemical delivery system that can handle up to 3 different chemicals and 3 different gases in a precise controlled operation.