CVD coating machines

Titan Loadlocked RIE or PECVD with Vacuum Cassette Elevator A very compact, fully automated, vacuum loadlocked plasma system for semi-conductor production. Available in either Reactive Ion Etch (RIE) configuration, High Density Inductive ...

Oracle Loadlocked RIE/PECVD with Vacuum Cassette Elevator The Oracle III is the smallest and most flexible full production cluster system on the market. The system consists of a central vacuum transport (CVT), vacuum cassette elevators ...

Orion III Plasma Enhanced Chemical Vapor Deposition (PECVD) System The Orion III PECVD system produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at ...

Radiance is designed to make life easy with the flexibility to configure it just how you you need to enable your technology roadmap Flexible process environments Adjustable source to substrate separation, direct wafer or carrier handling ...

Veeco’s award-winning EPIK™ 700 MOCVD system is the LED industry’s highest productivity MOCVD system that reduces cost per wafer by up to 20 percent compared to previous generations. Available in one-and two-reactor configurations, EPIK700 ...

Veeco’s new TurboDisc K475i As/P MOCVD System is the industry’s best reactor for the production of red, orange, yellow (R/O/Y) LEDs, as well as multi-junction III-V solar cells, laser diodes and transistors. The K475i system features ...

The SI 500 D plasma deposition tool represents the leading edge for plasma enhanced chemical vapor deposition of dielectric films, a-Si, SiC, and other materials. It is based on PTSA plasma source, separated gas inlets for reaction gasses, ...

YES vapor deposition systems provide total environmental control over the deposition process and accommodate a variety of functionally diverse silanes, for a variety of processes, on a variety of surfaces. YES works collaboratively with ...

Features UBM Sputtering system for DLC Excellent surface morphology and good wear resistance Fully automation and compiling database Target size : 406.4mm x 127mm x 12mmt System size : 2.6m(L) x 2.3m(W) x 1.9m(H)

Features Hot filament CVD system for diamond coating Excellent adhesion by two step etching methods Excellent smooth surface and hardest hardness Fully automated process and compiling database System size : 3.0m(L) x 3.0m(W) x 2.5m(H)

LEYBOLD OPTICS DLC is a high-vacuum plasma-enhanced chemical vapor deposition (PECVD) system for the application of anti-reflective (AR) coatings mainly used within infrared (IR) applications for thermal imaging systems. Industry leaders ...

The Bühler Leybold Optics CompactMet is an economic, compact and ultra-fast batch-type aluminum evaporation machine for vacuum coating of three-dimensional parts such as automotive plastic head light and tail light reflectors. The machine’s ...

NANO-MASTER, Inc. PECVD systems are capable of depositing high quality SiO2, Si3N4, or DLC films on up to 8” diameter substrate sizes. To generate plasma, it uses RF shower head electrode or Hollow Cathode RF plasma source with Fractal ...

Most important Features: Combined PVD & PECVD process - to deposit very smooth coatings Special Si containing gas line - controlled by additional Mass Flow Controller Silicon increases heat resistance Silicon decreases internal stress ...

Application The PECVD pilot coater is intended for producing p-i-n stacks of amorphous hydrogenated silicon on metal foils. The cotar is used as an experimentation tool for optimization of plasma enhanced chemical vapour deposition of ...